To provide technical means for improving fire-resistance by rendering various substrates inflammable, with which technical means various substrates can easily and at low cost be bestowed with sufficiently high fire-resistance to satisfy to the maximum extent recognized standards for fireproof materials as found in the Building Standards Act. Further, an aim of the invention is to provide easily and at low cost fire-resistant construction materials with sufficiently high fire-resistance to satisf...

Provided is a polishing agent composition for CMP, capable of minimizing the generation of scratches and giving the surface of a device wafer a good evenness. The polishing agent for chemical and mechanical polishing of the invention contains following components (A), (B) and (C). Component (A): surface-modified inorganic oxide particles modified by a group in which the surface of the inorganic oxide particles contains a polyglycerol chain . Component (B): polishing agent. Component (C): water. ...