The present invention relates to thermally conductive pigments consisting of a substrate and an aluminium oxide and/or aluminium oxide hydrate applied thereto, a method for producing said pigments, and use thereof.

PURPOSE: A manufacturing method of a fluorescent substance is provided to keep an even mixing rate, and to white-design at a chip scale. CONSTITUTION: A manufacturing method of a fluorescent substance comprises the steps of: mixing acetic acid with powder mixed with a fluorescent material (S2)

PURPOSE: A phenothiazine derivative is provided to increase the quantity of dye adsorbed on the surface of metal oxides when the derivative is used as a dye in a dye-sensitized solar cell, thereby increasing the density of short-circuit photovoltaic current and obtaining a cheap solar cell of high efficiency and excellent durability. CONSTITUTION: A phenothiazine derivative is denoted by chemical formula 1. An acceptor is selected among 5-oxo-1-phenyl-2-pyrazoline-3-carboxylic acid, 2-(4-oxo-2-t...

PURPOSE: A manufacturing method of a dye-sensitized solar battery is provided to prevent cracks, to reduce the amount of residual carbon on the surface thereof, to effectively absorb dye, and to increase light conversion efficiency. CONSTITUTION: A manufacturing method of a dye-sensitized solar battery comprises a step of adding a titanium isopropoxide, an acetic acid, and a surfactant into an alcohol and stirring the mixture

PURPOSE: A CMP slurry composition is provided to maintain 200 not A/min or more polishing rate to an oxide film and to have a polishing selectivity which is a ratio of a polishing rate to an oxide film and a polishing rate to a nitride film is 50 or more. CONSTITUTION: A CMP slurry composition uses a monocarboxylic acid as a dispersant and a ceria particle which has a positive surface potential by modifying the surface with a hydrogen phthalate compound

PURPOSE: An etching composition and a wet etching method are provided to selectively etch a high-impurity layer and a low-impurity layer on a semiconductor layer and to have a quick etching rate. CONSTITUTION: An etching composition for a semiconductor substrate comprises 3-20 wt% of a hydrofluoric acid, 5-40 wt% of a nitric acid, 10-60 wt% of an acetic acid, 2-20 wt% of an accelerator, and a residual water. The accelerator is one or more selected from ammonium compounds or sulfonic acid compoun...

This invention relates to a mouthwash comprising an aqueous solution of an effective amount of an orally acceptable, soluble zinc salt together with an effective amount of a preservative selected from methylisothiazolinone (MIT), benzyl alcohol, glycerol monocaprylate, and combinations thereof